| Customization: | Available |
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| After-sales Service: | 2 Years |
| Warranty: | 1 Years |
| Shipping Cost: | Contact the supplier about freight and estimated delivery time. |
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| Payment Methods: |
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| Support payments in USD |
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| Refund policy: | Claim a refund if your order doesn't ship, is missing, or arrives with product issues. |
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PECVD System
The PECVD system uses microwave or radio frequency to ionize the gas containing the film constituent atoms to form a plasma locally. The plasma has a strong chemical activity and is easy to react to deposit the desired film on the substrate. The system is widely used to deposit high-quality SiO2 film, Si3N4 film, diamond film, hard film, optical film, carbon nanotube (CNT), C/C composite material, SiC coating, graphite product coating, etc.
| Model | DM-12NT-PECVD | DM-14ST-PECVD | DM-17MT-PECVD |
| Max Temperature | 1200ºC | 1400ºC | 1700ºC |
| Working Temperature | 1100ºC | 1300ºC | 1600ºC |
| Heating Element | Resistance Wire | SiC | MoSi2 |
| Thermocouple | K Type | S Type | B Type |
| Temperature Zone | Number/Diameter/Length(Can Be Customized) | ||
| Temperature Accuracy | ±1ºC | ||
| Rated Voltage | AC220V50Hz/60Hz (can be customized) | ||
| Gas Control | Float Flow Meter/Mass Flow Meter | ||
| Vacuum System | Rotary Pump/Diffusion Pump/Turbo Molecular Pump(Optional) | ||
| RF Power | 100-1000W(Optional) | ||
| Optional Function | Touch Screen/Remote Control/Computer Monitoring | ||
| Can Be Customized | |||
Q1. How about after-sales service ?
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